Phase stability in MoTe2 prepared by low temperature Mo tellurization using close space isothermal Te annealing
- E. Sánchez-Montejo,
- G. Santana,
- A. Domínguez,
- L. Huerta,
- ,
- M. López-López
- University of Havana,
- Universidad de la Isla de la Juventud Jesús Montané Oropesa,
- Universidad Nacional Autónoma de México,
- ,
- ,
- Centro de Investigacion y de Estudios Avanzados del Instituto Politécnico Nacional
Publication Information
Tipo de resultado
Idioma original
InglésPáginas desde-hasta (Número de páginas)
Páginas 317-323 (7 páginas)Revista (Volumen, Número de Edición)
Materials Chemistry and Physics (Volumen 198)Hitos de publicación
- Publicada - 01/09/2017
Estado de publicación
ISSN
0254-0584Publication IDs
- Scopus: 85024386365
Abstract
In this work, we used isothermal close space (ICS) Te annealings in pure H2 atmosphere for the tellurization of Mo oxide thin films. Differently to previous open tube tellurization annealings, ICS is expected to provide a higher Te vapor pressure because the chamber containing the Te source and the substrate is very small and semi-closed. Then, we used a relatively low temperature of 500 °C at which, according to the phase diagram, 2H phase should be stable. However, we observed that, in all cases, Mo oxide initially transformed to 1T′ before reaching the equilibrium 2H phase. Highly oriented MoTe2 films with the [001] direction perpendicular to the surface were obtained in all samples. On the other hand, according our X-ray photoelectron spectroscopy measurements, we report shifts of 0.38/0.27 eV in the 3d emission of Te/Mo between the two different phases which probably have a chemical origin.
