Passa alla casella di ricercaPassa alla navigazionePassa al contenuto principale

Preferential regions of growth of chemical bath deposited ZnO and Zn(OH)2 thin films at room conditions

*Corresponding author for this work
Research Output:
Contribution to journal
Article
Peer review

Publication Information

Tipo di output

Research Output:
Contribution to journal
Article
Peer review

Lingua originale

English

Pagine da-a (Numero di pagine)

Pagine 231-240 (10 pagine)

Rivista (volume, numero edizione)

Thin Solid Films (Volume 645)

Attività cardine della pubblicazione

  • Published - 01/01/2018

Stato pubblicazione

Published - 01/01/2018

ISSN

0040-6090

Publication IDs

  • Scopus: 85032682904

Abstract

Zinc oxide (ZnO) and zinc hydroxide (Zn(OH)2) films were deposited onto glass substrates at room conditions (25 °C and atmospheric pressure) by the chemical bath deposition technique. ZnSO4, KOH, and NH4NO3 were used as chemical reagents for the chemical bath. The species distribution diagrams and the solubility curves were used to find the most adequate chemical conditions for the selective film deposition according to the concentrations and type of chemical reagents. The selective deposition of ZnO and/or Zn(OH)2 was achieved by adjusting the pH of the chemical bath in the range from 11.35 to 12.30, where three regions of growth were determined. The optical bandgap energy measured on the films ranged from 3.31 eV for Zn(OH)2 to 3.41 eV for ZnO. Lower values of Urbach energy were found when the ZnO formation was dominant. X-ray diffraction analysis showed that the pH of the chemical bath influences on the crystallinity of the films, where better crystallinity was observed for films with higher presence of ZnO. An aging experiment to evaluate the stability of the ZnO 15 weeks after the deposition process was carried out.